Micron this week officially said that it would equip its fab in Hiroshima, Japan, to produce DRAM chips on its 1γ (1-gamma) process technology, its first node to use extreme ultraviolet lithography, in 2025. The company will be the first chipmaker to use EUV for volume production in Japan and its fabs in Hiroshima and Taiwan will be its first sites to use the upcoming 1γ technology. As the only major DRAM maker that has not adopted extreme ultraviolet lithography, Micron planned to start using it with its 1γ process (its 3rd Generation 10nm-class node) in 2024. But due to PC market slump and its spending cuts, the company had to delay the plan to 2025. Micron's 1γ process technology is set to use EUV...

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